Influence of Dislocations on Nitrogen±Oxygen Complex in Silicon

نویسندگان

  • Deren Yang
  • Duanlin Que
چکیده

The influence of dislocations on nitrogen±oxygen (N±O) complexes in nitrogen-doped Czochralski (NCZ) silicon was investigated. It was found that N±O complexes were generated during annealing at 650 C for 10 min. In the early stage of annealing the amount of the N±O complexes in NCZ silicon with dislocations was almost the same as in dislocation-free NCZ silicon. However, the N±O complexes in NCZ silicon with dislocations were annihilated after annealing for only 2 h, while those complexes in dislocation-free NCZ silicon were annihilated after annealing for 60 h. It is considered that the formation of N±O complexes is suppressed by dislocations and its mechanism is also discussed.

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تاریخ انتشار 1999